We are more than an asset library

Watch our Showreel
Search
Cart
Sign in
  • offerCustomer zone
  • offerYour orders
  • offerEdit account

  • offerAdd project
  • offerLiked projects
  • offerView your artist profile

  • Dark mode
    ✔
Marvelous Designer 9 released

Marvelous Designer 9 released

Press Release 2019-10-14 10:48 article  > All

Equipped with new features such as GPU Simulation, Retopology, Half Pattern Symmetry, Subdivision and many others.

Top image: A Reverse Film by SOMEI

Marvelous Designer 9 will enable more efficient pipelines. 

Marvelous Designer 9 Features:

  • GPU Simulation - Select Simulate (GPU) for faster Simulation when working on a 3D Garment.
  • Retopology - Draw topology lines on a pattern and create a new mesh.
  • Half Pattern Symmetry - Edit a single pattern symmetrically based on its center line.
  • Subdivision - Subdivide mesh of selected area.
  • Mirror Creation - Symmetrically create polygons, internal polygon patterns.
  • Environment Display 3D (Improved) - Environment Display 3D on the 3D window.
  • Pattern Making Tools (Improved) - Pattern Making tools are merged to a group menu.
  • Texure Bake (Improved)
  • Create Buttonholes along Pattern Outline (Improved)

Author: Press Release
Tags:
You may also like...
Oruva brings 3ds Max scenes to Blender, Cinema 4D and others - with materials converted for each renderer

Oruva brings 3ds Max scenes to Blender, Cinema 4D and others - with materials converted for each renderer

A new Windows tool reads native .max files and rebuilds V-Ray and Corona materials for target renderers, letting multi-software studios skip re-setup work.
×

LEAVE A COMMENT

You need to be logged in to leave a comment. Don't have account? Register now.